Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2007-02-13
2007-02-13
Tran, Thuy Vinh (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C333S017300, C333S032000, C333S0990PL, C324S637000, C204S298080
Reexamination Certificate
active
10951049
ABSTRACT:
A plasma generating method generates plasma in a treating chamber by controlling a high-frequency generating unit to generate a high-frequency signal and by feeding the high-frequency signal to the treating chamber through an impedance matching device. The plasma generating method includes controlling the impedance matching device, when the plasma is generated in the treating chamber, so as to satisfy a preset matching condition, and then controlling the high-frequency generating unit to generate and feed the high-frequency signal of the power generating the plasma, to the treating chamber.
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Kasai Shigeru
Kitamura Toshiaki
Ogino Takashi
Osada Yuki
Rokuyama Koichi
Osha & Liang LLP
Tokyo Electron Limited
Tran Thuy Vinh
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