Coaxial plasma processing apparatus

Details Coaxial plasma processing apparatus Coaxial plasma processing apparatus

1992-11-20

2000-05-30

Chang, Joni

Coating apparatus

Gas or vapor deposition

With treating means

C23C 1600

Patent

active

060679301

ABSTRACT:
A tubular reaction chamber is mounted on an annular insulating plate disposed on a grounded metallic base plate. A cylindrical outer electrode connected to a high-frequency power supply is disposed around said tubular reaction chamber, and a cylindrical inner electrode is disposed in said reaction chamber coaxially with said cylindrical outer electrode. The cylindrical inner electrode has a plurality of inlet holes defined therein, and a lower end disposed in an opening defined in the metallic base plate and fixed to said metallic base plate. A holder is disposed in said cylindrical inner electrode for supporting a plurality of wafers at spaced intervals.

REFERENCES:
patent: 4367114 (1983-01-01), Steinberg et al.
patent: 4372806 (1983-02-01), Vossen, Jr.
patent: 5099100 (1992-03-01), Bersin et al.

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