Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-05-24
2010-10-19
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S311000, C430S313000, C430S317000, C430S325000, C430S326000, C528S366000, C528S105000, C528S097000
Reexamination Certificate
active
07816067
ABSTRACT:
To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative.A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1):wherein A is an organic group having an aromatic group, R1is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.
REFERENCES:
patent: 5693691 (1997-12-01), Flaim et al.
patent: 5919599 (1999-07-01), Meador et al.
patent: 62-25116 (1987-02-01), None
patent: A 11-511194 (1999-09-01), None
patent: A 2002-14474 (2002-01-01), None
patent: A 2004-205685 (2004-07-01), None
English abstract for JP 62-25116, provided by JPO.
Lynch et al., “Properties and Performance of Near UV Reflectivity Control Layers,”Proceedings of SPIE, vol. 2195, pp. 225-229, (1994).
Taylor et al., “Methacrylate Resist and Antireflective Coatings for 193 nm Lithography,”Proceedings of SPIE, vol. 3678, pp. 174-185 (1999).
Meador et al., “Recent Progress in 193 nm Antireflective coatings,”Proceedings of SPIE, vol. 3678, pp. 800-809 (1999).
Enomoto Tomoyuki
Kishioka Takahiro
Sakaguchi Takahiro
Lee Sin J.
Nissan Chemical Industries Ltd.
Oliff & Berridg,e PLC
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