Coating station

Details Coating station Coating station

1999-01-27

2000-09-26

McDonald, Rodney

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419227, 20419212, 20429827, 20429828, 20429829, 20429815, 20419228, C23C 1434

Patent

active

061238147

ABSTRACT:
A coating station has a flat sputter source opposite a workpiece receiving arrangement is configured as a planet arrangement. The rotating axes (A.sub.P) of the planets intersect one another on a rotating axis (A.sub.S) of the sun system on the side facing away from the sputter source. As a result, substrates, particularly optical lenses, can be coated in extremely small batches according to given formulas in an advantageously flexible manner.

REFERENCES:
patent: 3889632 (1975-06-01), Brunner et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 5074246 (1991-12-01), Gailiard et al.
patent: 5292417 (1994-03-01), Kugler
patent: 5525199 (1996-06-01), Scobey

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