Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-09-08
2000-10-17
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302811, 4302861, 430905, 430920, 4302731, G03C 172
Patent
active
061329282
ABSTRACT:
A coating solution for forming an antireflective coating film making it possible to form a uniform coating film, which sustains an antireflective effect and shows no unevenness of coating or little surface discontinuity, even in a small application dose and thus ensuring the production of semiconductor devices at a low cost and a high efficiency. The coating solution for forming an antireflective coating film is one to be used for forming an anti-interference film on a resist film, characterized in that the coating solution gives a contact angle to the resist film of 15.degree. or below, when applied onto the resist film.
REFERENCES:
patent: 5631314 (1997-05-01), Wakiya et al.
patent: 5783362 (1998-07-01), Wakiya et al.
Kobayashi Masakazu
Nakayama Toshimasa
Tanabe Masahito
Wakiya Kazumasa
Chu John S.
Clarke Yvette M.
Tokyo Ohka Kogyo Co. Ltd.
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