Coating materials consisting of low- or medium-molecular...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S905000, C430S908000, C528S272000, C528S296000, C528S302000, C528S305000

Reexamination Certificate

active

07919224

ABSTRACT:
A coating material including a low-molecular or medium-molecular organic compound represented by general formula (1).(In the formula, R1is a single bond, methylene, ethylene or oxygen; and R2is a hydrogen atom, or a hydrocarbon group, a fluorine-containing alkyl group, a cyclic form containing an aromatic group or aliphatic group, which may contain hydroxy group, carboxyl group, amino group, amide group, imide group, glycidyl group, cyano group, fluorocarbinol group, sulfonic group or sulfonylamide group, and a complex thereof, and may contain a fluorine atom, oxygen atom, nitrogen atom, silicon atom or sulfur atom, and R2's of the same type or different type may be connected by an ester bond, amide bond, ether bond, thioether bond, thioester bond or urethane bond.). This compound can be derived from a diol compound and bicyclo[2.2.2]octane-2,3:5,6-tetracarboxylic anhydride.

REFERENCES:
patent: 6197880 (2001-03-01), Nigam
patent: 6572690 (2003-06-01), Rehman et al.
patent: 7005248 (2006-02-01), Kurosawa et al.
patent: 7517635 (2009-04-01), Miyazawa et al.
patent: 2004/0062878 (2004-04-01), Mano et al.
patent: 2008/0003517 (2008-01-01), Komoriya et al.
patent: 2008/0050674 (2008-02-01), Miyazawa et al.
patent: 2009/0182114 (2009-07-01), Kusaka et al.
patent: 1 418 618 (2004-05-01), None
patent: 63 057657 (1988-03-01), None
patent: 07 005707 (1995-01-01), None
patent: 07 209649 (1995-08-01), None
patent: 9-95533 (1997-04-01), None
patent: 11-60732 (1999-03-01), None
patent: 11 237740 (1999-08-01), None
patent: 2002-512313 (2002-04-01), None
patent: 2002-332443 (2002-11-01), None
patent: 2005-232095 (2005-09-01), None
International Search Report dated Oct. 24, 2006 with English translation of relevant portion (Five (5) pages).
PCT/ISA/237 dated Oct. 24, 2006 (Three (3) pages).
Takuya Hagiwara et al.,Characterization of Fluoropolymer Resist for 157-nm Lithography, Journal of Photopolymer Science and Technology, vol. 16, No. 4, 2003, pp. 557-564.
Francis Houlihan et al.,New Fluorinated Resins for 157 nm Lithography Application, Journal of Photopolymer Science and Technology, vol. 16, No. 4, 2003, pp. 581-590.
Shinichi Kanna et al.,A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist, Journal of Photopolymer Science and Technology, vol. 16, No. 4, 2003, pp. 595-600.
Takashi Sasaki et al.,A New Monocyclic Fluoropolymer for 157-nm Photoresists, Journal of Photopolymer Science and Technology, vol. 17, No. 4, 2004, pp. 639-644.
European Search Report dated Jan. 4, 2010.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Coating materials consisting of low- or medium-molecular... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Coating materials consisting of low- or medium-molecular..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coating materials consisting of low- or medium-molecular... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2650848

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.