Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent
1996-04-29
1998-08-04
Geist, Gary
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
427 96, 428446, H01L 202
Patent
active
057893250
ABSTRACT:
A silica-containing coating is formed on an electronic substrate by applying a polycarbosilane on the substrate and converting it to a silica-containing material by heating in an oxidizing environment. The resultant thick planarizing coatings are useful as protective coatings and dielectric inner layers.
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Chandra Grish
Haluska Loren Andrew
Michael Keith Winton
Dow Corning Corporation
Geist Gary
Gobrogge Roger E.
Severance Sharon K.
Vollano Jean F.
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