Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2011-04-05
2011-04-05
Visconti, Geraldina (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S271100, C430S325000
Reexamination Certificate
active
07919222
ABSTRACT:
Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
REFERENCES:
patent: 7585612 (2009-09-01), Thackeray et al.
Thackeray James W.
Vohra Vaishali Raghu
Wayton Gerald B.
Corless Peter F.
Edwards Angell Palmer & & Dodge LLP
Frickey Darryl P.
Rohm and Haas Electronics Materials LLC
Visconti Geraldina
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