Coating apparatus – Projection or spray type – Rotating work
Patent
1991-09-06
1993-10-05
Wilczewski, Mary
Coating apparatus
Projection or spray type
Rotating work
118323, 118326, 118501, 118 52, H01L 2168, H01L 2130, B05B 300
Patent
active
052501140
ABSTRACT:
A coating apparatus includes two spin chucks located in a single casing to support and rotate wafers. A waiting trench is located between the spin chucks to discharge that part of coating liquid which has been hardened at the tip of a nozzle. The wafers are loaded and unloaded to and from the spin chucks by a single carrying member located outside the casing. A coating liquid supply mechanism includes the single nozzle for dispensing coating liquid onto the wafers supported by the spin chucks. The nozzle is moved between the spin chucks by a moving arm. Processing cycles relative to the spin chucks are set for a same processing time and the processing cycle relative to one of the spin chucks is shifted from that relative to the other by a half cycle. The nozzle is rested on the waiting trench at the time when it does not dispense the coating liquid onto the wafers supported by the spin chucks.
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Akimoto Masami
Konishi Nobuo
Takamori Hideyuki
Tateyama Kiyohisa
Tokyo Electron Kyushu Limited
Tokyo Electron Limited
Wilczewski Mary
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