Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1989-07-10
1991-11-26
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419217, 2041923, C23C 1446
Patent
active
050680200
ABSTRACT:
Disclosed herein is a coated substrate and a process for forming films on substrates and for providing a particularly smooth film on a substrate. The method of this invention involves subjecting a surface of a substrate to contact with a stream of ions of an inert gas having sufficient force and energy to substantially change the surface characteristics of said substrate, and then exposing a film-forming material to a stream of ions of an inert gas having sufficient energy to vaporize the atoms of said film-forming material and to transmit the vaporized atoms to the substrate surface with sufficient force to form a film bonded to the substrate. This process is particularly useful commercially because it forms strong bonds at room temperature.
This invention is particularly useful for adhering a gold film to diamond and forming ohmic electrodes on diamond, but also can be used to bond other films to substrates.
REFERENCES:
patent: 2411867 (1946-12-01), Brenner
patent: 3875028 (1975-04-01), Atlee et al.
patent: 4219199 (1980-08-01), Okuda
patent: 4402993 (1983-09-01), Aisenberg et al.
patent: 4411963 (1983-10-01), Aine
patent: 4560577 (1985-12-01), Mirtich et al.
patent: 4820392 (1989-04-01), Moskowitz et al.
R. N. Castellano et al., Vacuum, 27, No. 3, pp. 109-117, (1977).
J. E. E. Baglin, Interface Tailoring for Adhesion Using Ion Beams, Nuclear Instruments and Methods in Physics Research, 1989, pp. 764-768.
Childs Charles B.
Chu Wei-Kan
Leader William T.
Niebling John F.
The University of North Carolina at Chapel Hill
LandOfFree
Coated substrates and process does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Coated substrates and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Coated substrates and process will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2384972