Coated material and X-ray exposure mask

Details Coated material and X-ray exposure mask Coated material and X-ray exposure mask

1987-09-03

1989-09-12

Zimmerman, John J.

X-ray or gamma ray systems or devices

Specific application

Lithography

428698, G21F 108, B32B 900

Patent

active

048667463

ABSTRACT:
A coated material comprises: a substrate; and a film containing boron, nitrogen and one selected from a group consisting of silicon and germanium, the film being formed on the substrate. An X-ray exposure mask of the present invention comprises: an X-ray absorbent layer; an X-ray permeable support layer for supporting the absorbent layer; and a mask support member for supporting the support layer; wherein the support layer contains boron and nitrogen and one element selected from a group consisting of silicon and germanium.

REFERENCES:
patent: 4253029 (1981-02-01), Lepselter et al.
patent: 4515876 (1985-05-01), Yoshihara et al.
patent: 4543266 (1985-09-01), Matsuo et al.
patent: 4647517 (1987-03-01), Hersener et al.
patent: 4719161 (1988-01-01), Kimura
Nakae, Hiroyoki et al., Adherent Boron Nitride Film, Chemical Abstracts, vol. 102, Article 118457g, Nov. 1984.

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