Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2006-05-30
2006-05-30
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192260, C204S192270, C204S192280, C427S523000, C427S529000, C427S530000, C427S249170, C427S249190, C427S255391
Reexamination Certificate
active
07052585
ABSTRACT:
A coated article is provided which includes a layer including titanium oxycarbide. In order to form the coated article, a layer of titanium oxide is deposited on a substrate by sputtering or the like. After sputtering of the layer including titanium oxide, an ion beam source(s) is used to implant at least carbon ions into the titanium oxide. When implanting, the carbon ions have sufficient ion energy so as to knock off oxygen (O) from TiOxmolecules so as to enable a substantially continuous layer comprising titanium oxycarbide to form near a surface of the previously sputtered layer.
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International Search Report mailed Mar. 8, 2005.
Petrmichl Rudolph Hugo
Thomsen Scott V.
Veerasamy Vijayen S.
Guardian Industries Corp.
McDonald Rodney G.
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