CMP systems and methods utilizing amine-containing polymers

Details CMP systems and methods utilizing amine-containing polymers CMP systems and methods utilizing amine-containing polymers

2006-02-28

2006-02-28

Rose, Robert A. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S037000

Reexamination Certificate

active

07004819

ABSTRACT:
The invention provides a chemical-mechanical polishing system and method comprising a liquid carrier, a polishing pad and/or an abrasive, and at least one amine-containing polymer, wherein the amine-containing polymer has about 5 or more sequential atoms separating the nitrogen atoms of the amino functional groups or is a block copolymer with at least one polymer block comprising one or more amine functional groups and at least one polymer block not comprising any amine functional groups.

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