Compositions – Etching or brightening compositions
Reexamination Certificate
2006-01-27
2010-11-30
Vinh, Lan (Department: 1713)
Compositions
Etching or brightening compositions
C438S689000, C438S690000, C438S692000, C438S693000, C438S745000, C051S298000, C051S307000
Reexamination Certificate
active
07842191
ABSTRACT:
A CMP slurry for metallic film is provided, which includes water, 0.01 to 0.3 wt %, based on a total quantity of the slurry, of polyvinylpyrrolidone having a weight average molecular weight of not less than 20,000, an oxidizing agent, a protective film-forming agent containing a first complexing agent for forming a water-insoluble complex and a second complexing agent for forming a water-soluble complex, and colloidal silica having a primary particle diameter ranging from 5 to 50 nm.
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Notification of First Office Action from Chinese Patent Office in Application No. 2006/0076096.5, dated Jun. 13, 2008.
Notice of Reasons for Rejection mailed Aug. 31, 2010, in corresponding Japanese Patent Application No. 2005-132095 and English-language translation thereof.
Fukushima Dai
Kurashima Nobuyuki
Minamihaba Gaku
Yamamoto Susumu
Yano Hiroyuki
Angadi Maki A
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Vinh Lan
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