4. Active solid-state devices (e.g., transistors, solid-state diode
  5. Combined with electrical contact or lead
  6. Of specified material other than unalloyed aluminum

Gaku Minamihaba

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Aqueous dispersion for chemical mechanical polishing used...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
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Aqueous dispersion for CMP, polishing method and method for...

Etching a substrate: processes – Nongaseous phase etching of substrate – Using film of etchant between a stationary surface and a...
Reexamination Certificate

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AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL...

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
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Chemical mechanical method of polishing wafer surfaces

Abrading – Abrading process – Utilizing fluent abradant
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Chemical mechanical polishing aqueous dispersion and...

Abrading – Abrading process – Utilizing fluent abradant
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Profile ID: LFUS-PAI-P-1662031

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