Abrading – Accessory – Dressing
Reexamination Certificate
2009-01-16
2011-10-25
Eley, Timothy V (Department: 3723)
Abrading
Accessory
Dressing
C051S293000, C051S307000, C451S072000
Reexamination Certificate
active
08043145
ABSTRACT:
CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser wear.
REFERENCES:
patent: 2817885 (1957-12-01), Long
patent: 2999275 (1961-09-01), Blume, Jr.
patent: 3877891 (1975-04-01), Inoue
patent: 4425315 (1984-01-01), Tsuji et al.
patent: 4680199 (1987-07-01), Vontell et al.
patent: 4916869 (1990-04-01), Oliver
patent: 4925457 (1990-05-01), deKok et al.
patent: 4968326 (1990-11-01), Wiand
patent: 5203881 (1993-04-01), Wiand
patent: 5250084 (1993-10-01), Lansell et al.
patent: 5380390 (1995-01-01), Tselesin
patent: 5453106 (1995-09-01), Roberts
patent: 5785039 (1998-07-01), Kobayashi et al.
patent: 5921856 (1999-07-01), Zimmer
patent: 5989405 (1999-11-01), Murata et al.
patent: 6039641 (2000-03-01), Sung
patent: 6159087 (2000-12-01), Birang et al.
patent: 6190240 (2001-02-01), Kinoshita et al.
patent: 6213586 (2001-04-01), Chen
patent: 6213856 (2001-04-01), Cho et al.
patent: 6286498 (2001-09-01), Sung
patent: 6325709 (2001-12-01), Nanda et al.
patent: 6368198 (2002-04-01), Sung et al.
patent: 6669745 (2003-12-01), Prichard et al.
patent: 6852004 (2005-02-01), Chu et al.
patent: 6872127 (2005-03-01), Lin et al.
patent: 6884155 (2005-04-01), Sung et al.
patent: 6945857 (2005-09-01), Doan et al.
patent: 6958005 (2005-10-01), Charatan
patent: 7491116 (2009-02-01), Sung
Tsai, Ming-Yi et al., “CMP Pad Dressing with Oriented Diamond”, Twenty First International VLSI Multilevel Interconnection Conference, Sep. 30-Oct. 2, 2004, pp. 1-5.
Eley Timothy V
Thorpe North & Western LLP
LandOfFree
CMP pad dresser with oriented particles and associated methods does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with CMP pad dresser with oriented particles and associated methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and CMP pad dresser with oriented particles and associated methods will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4276475