CMP machine dresser and method for detecting the...

Details CMP machine dresser and method for detecting the... CMP machine dresser and method for detecting the...

2005-02-08

2005-02-08

Thomas, David B. (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

With indicating

C451S056000, C451S443000

Reexamination Certificate

active

06852004

ABSTRACT:
A CMP machine dresser. The dresser includes a substrate, a first conductive layer and a second conductive layer respectively disposed and isolated in the substrate, a plurality of diamonds mounted in the first conductive layer and the second conductive layer, and a bonding layer disposed on the substrate for attaching the diamonds. The first conductive layer and the second conductive layer detect the conductive materials penetrating the original position of the diamonds when any of the diamonds dislodges, so as to determine the diamonds dislodgement.

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