Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Physical stress responsive
Reexamination Certificate
2005-11-10
2008-10-14
Hoang, Quoc D (Department: 2892)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Physical stress responsive
C438S052000, C257SE21613, C257SE29324
Reexamination Certificate
active
07435612
ABSTRACT:
A fully CMOS compatible MEMS multi-project wafer process comprises coating a layer of thick photoresist on a wafer surface, patterning the photoresist to define a micromachining region, and performing a micromachining in the micromachining region to form suspended microstructures.
REFERENCES:
patent: 7012322 (2006-03-01), Ridley et al.
patent: 7026247 (2006-04-01), Dokumaci et al.
Chiu Chin-Fong
Juang Ying-Zong
Xiao Fu-Yuan
Hoang Quoc D
National Applied Research Laboratories National Chip Implementat
Rosenberg , Klein & Lee
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