Patent
1986-07-30
1988-03-01
James, Andrew J.
357 42, 357 231, 357 232, 357 91, H01L 2916, H01L 29163, H01L 2978
Patent
active
047289988
ABSTRACT:
The tendency of a CMOS circuit to latch up is reduced by implanting ions of germanium or tin into the source and drain regions of the circuit. The low energy gap of these ions lowers the band gap of the source and drain regions, which in turn inhibits their ability to inject carriers into the substrate and well.
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Milnes & Feucht, Heterojunctions and Metal-Semiconductor Junctions, Academic Press, N.Y., 1972.
Carroll David H.
Fairchild Semiconductor Corporation
Jackson, Jr. Jerome
James Andrew J.
LaBarre James A.
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