Cluster tool soft etch module and ECR plasma generator therefor

Details Cluster tool soft etch module and ECR plasma generator therefor Cluster tool soft etch module and ECR plasma generator therefor

1993-04-16

1994-01-18

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 31511181, 31323131, 20429838, 20429837, 20429816, H01J 724

Patent

active

052802191

ABSTRACT:
An electron cyclotron resonance plasma generator is provided in a semiconductor wafer plasma processing apparatus and cluster tool module, particularly for use in soft etching. The generator generates a uniform plasma by rotating a plasma producing resonance supporting magnetic field about the axis of a resonance cavity within the vacuum chamber of a plasma processor. The rotated field preferably is a single-cusp or multicusp field. Gas uniformly flows into and through the cavity from a gas distribution shower. Microwave energy is evenly divided and coupled into the cavity in a TM.sub.01 mode by a plurality of axially and radially aligned loops.

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