Cluster-included material

Details Cluster-included material Cluster-included material

1997-09-09

2000-08-22

Dunn, Tom

Catalyst, solid sorbent, or support therefor: product or process

Solid sorbent

Silicon containing

502104, 502107, 428116, 4283126, 428446, B01J 2010

Patent

active

061072435

ABSTRACT:
The present cluster-included material characterized by utilizing a porous host material for clusters having a pore larger in size than that of zeolite. The cluster-included material is obtained by forming a cluster in a pore of a mesoporous material having a pore size of 1.3 to 10 nm. When the mesoporous material is particularly a mesoporous material having a pore volume of not less than 60% of a total pore volume within a pore size range of -40 to +40% of a pore size which shows a maximum peak in a pore size distribution curve, a granular cluster having a uniform particle size or a fine-linear cluster having a uniform diameter is obtained. The cluster-included material performs the various quantum effects.

REFERENCES:
patent: 4703029 (1987-10-01), Rieck et al.
patent: 4968652 (1990-11-01), Johnson et al.
patent: 5293037 (1994-03-01), Le Mehaute et al.
patent: 5334368 (1994-08-01), Beck et al.
patent: 5347060 (1994-09-01), Hellring et al.
patent: 5348687 (1994-09-01), Beck et al.
patent: 5350930 (1994-09-01), Schmid et al.
patent: 5382558 (1995-01-01), Inagaki et al.
patent: 5393329 (1995-02-01), Inagaki et al.
patent: 5508081 (1996-04-01), Inagaki et al.
patent: 5599759 (1997-02-01), Inagaki et al.
N. Herron et al, J. Am. Chem. Soc. vol. 111, No. 2, 530-540 (1989).
T. Yanagisawa et al., Bull. Chem. Soc. Jpn., 63, 988-922 (1990).
S. Inagaki et al., J. Chem. Soc. Chem. Commun., No. 8, 680-682 (1993).
C.T. Kresge et al, Nature, vol. 359, 710-712 (1992).

Affiliated with

Also associated with

Rating

Cluster-included material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cluster-included material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cluster-included material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-581010