Coating apparatus – Gas or vapor deposition – With treating means
Patent
1990-07-31
1992-03-31
Beck, Shrive
Coating apparatus
Gas or vapor deposition
With treating means
118726, 20419231, 20429805, 427 38, C23C 1650
Patent
active
050997912
ABSTRACT:
An apparatus for depositing, through evaporation, a thin film on a substrate disposed in a vacuum vessel by ionizing a beam of clusters emitted from an evaporation source and causing the ionized cluster beam to impinge on the substrate, comprises a thermionic emission portion for emitting thermoelectrons disposed in a plane orthogonal to the center axis of the cluster beam, a shield plate for preventing the cluster beam from striking the thermionic emission portion, and a reflection electrode for directing the thermoelectrons emitted from the thermionic emission portion toward the center axis of the cluster beam.
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Leon I. Maissel et al., IBM, "Handbook of Thin Film Technology", 1970, pp. 1-50-1-52.
Tsukazaki Hisashi
Yamanishi Ken-ichiro
Yasunaga Seiji
Beck Shrive
Mitsubishi Denki & Kabushiki Kaisha
Owens Terry J.
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