Closure for thermal reactor

Details Closure for thermal reactor Closure for thermal reactor

1980-02-21

1981-03-03

Kaplan, Morris

Coating apparatus

Gas or vapor deposition

Chamber seal

34242, 118724, 118728, C23C 1308

Patent

active

042534178

ABSTRACT:
Apparatus for thermal oxidation of silicon wafers at high pressures of a type wherein a reactor of a refractory material is disposed within a pressure vessel, and wherein a margin of a wafer portal of the reactor and a closure of the refractory material have congruent surfaces enabling a hermetic seal to be effected, an improvement is disclosed wherein the closure is mounted within a pressure-vessel head used to close an access portal of the pressure vessel by means of gimbals, whereby a hermetic seal can be effected at said surfaces despite misalignments.

REFERENCES:
patent: 3554162 (1971-01-01), Cota et al.
patent: 3658032 (1972-04-01), Kohler et al.
patent: 4018184 (1977-04-01), Nagasawa et al.
patent: 4116161 (1978-09-01), Steube
patent: 4154192 (1979-05-01), Tsubouchi et al.
patent: 4167915 (1979-09-01), Toole et al.
Japan Jo. of Applied Physics, vol. 16, No. 5 (1977), Tsubouchi et al., "Oxidation of Silicon in High Pressure Steam", pp. 855-856.
Japan Jo. of Applied Physics, vol. 16, No. 6 (1977), Tsubouchi et al., "High Pressure Steam Apparatus for Oxidation of Silicon", pp. 1055-1056.
Solid State Technology, vol. 22, No. 7, Jul. 1979, Zeto et al., "Pressure Oxidation of Silicon: An Emerging Technology", pp. 62-69.

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