Close space epitaxy process

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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427252, H01L 21203

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active

047625767

ABSTRACT:
A process of high pressure close-space epitaxy in the semi-confined atmosre of a reusable demountable ampule in a furnace growth chamber. The ampule has a substrate and source materials placed therein whereupon the ampule is then loaded in the pressure furnace and the furnace is sealed air tight. Alternate steps of high pressure gas scrubbing and evacuating the interior of the furnace growth chamber including the interior of the ampule through small vents are first used to purify the growth environment. The source materials are then epitaxially grown on the substrate at a high pressure within the ampule. The ampule may be repeatedly used without having to be destroyed after each growth.

REFERENCES:
patent: 3462323 (1969-08-01), Groves
patent: 3494743 (1970-02-01), Baughman et al.
patent: 3984267 (1976-10-01), Craford et al.
patent: 4211182 (1980-07-01), Rosnowski

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