Cleaning solutions for semiconductor devices

Details Cleaning solutions for semiconductor devices Cleaning solutions for semiconductor devices

1996-12-13

1999-01-26

Utech, Benjamin

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

438755, 438756, H01L 21302

Patent

active

058633448

ABSTRACT:
Cleaning solutions for semiconductor devices comprise tetramethyl ammonium hydroxide, acetic acid, and water. Methods of removing contaminants from semiconductor devices comprise contacting the semiconductor devices with cleaning solutions to remove the contaminants from the semiconductor devices.

REFERENCES:
patent: 4039371 (1977-08-01), Brunner et al.
patent: 5320707 (1994-06-01), Kanekiyo et al.
patent: 5466389 (1995-11-01), Ilardi et al.
patent: 5595927 (1997-01-01), Chen et al.

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