Cleaning solution for silicon surface and methods of...

Details Cleaning solution for silicon surface and methods of... Cleaning solution for silicon surface and methods of...

2006-07-20

2008-11-11

Dang, Trung (Department: 2892)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S756000

Reexamination Certificate

active

07449417

ABSTRACT:
There are provided a cleaning solution for a silicon surface containing a buffer solution including acetic acid (CH3COOH) and ammonium acetate (CH3COONH4), iodine oxidizer, hydrofluoric acid (HF), and water. In a method for fabricating a semiconductor device, a silicon substrate may have an exposed silicon surface, which may be cleaned using a cleaning solution that contains a buffer solution including acetic acid and ammonium acetate, iodine oxidizer, hydrofluoric acid, and water.

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