Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2006-11-14
2006-11-14
Norton, Nadine (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C134S001200, C134S041000, C216S104000, C252S079100
Reexamination Certificate
active
07135413
ABSTRACT:
A cleaning solution for use in removing a damaged portion of a ferroelectric layer, and a cleaning method using the solution. The cleaning solution includes a fluoride, an organic acid with carboxyl group, an alkaline pH adjusting agent and water.
REFERENCES:
patent: 5520299 (1996-05-01), Belcher et al.
patent: 6143706 (2000-11-01), Morinaga
Hah Sang-rok
Kwon Young-min
Lee Kun-tack
Lee Kwang-wook
Park Im-soo
F. Chau & Associates LLC
Norton Nadine
Samsung Electronics Co,. Ltd.
Umez-Eronini Lynette T.
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