Cleaning solution and cleaning method of a semiconductor device

Details Cleaning solution and cleaning method of a semiconductor device Cleaning solution and cleaning method of a semiconductor device

2006-09-12

2006-09-12

Del Cotto, Gregory R. (Department: 1751)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S175000, C510S257000, C510S477000, C510S488000, C510S499000, C438S692000

Reexamination Certificate

active

07105475

ABSTRACT:
A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide layer and then removing the chemical oxide layer, thereby removing foreign bodies from a surface of the semiconductor substrate. Accordingly, the foreign bodies can be substantially removed from the surface of the substrate without corroding a metal.

REFERENCES:
patent: 5258093 (1993-11-01), Maniar
patent: 5972862 (1999-10-01), Torii et al.
patent: 6194365 (2001-02-01), Lee
patent: 6200947 (2001-03-01), Takashima et al.
patent: 6245158 (2001-06-01), Verhaverbeke
patent: 6261845 (2001-07-01), Verhaverbeke et al.
patent: 6296714 (2001-10-01), Matsuo et al.
patent: 6453914 (2002-09-01), Torek et al.
patent: 6468357 (2002-10-01), Aoki et al.
patent: 6517738 (2003-02-01), Torek et al.
patent: 6562726 (2003-05-01), Torek et al.
patent: 2004/0224866 (2004-11-01), Matsunaga et al.
patent: 2004/0242446 (2004-12-01), Mun et al.
patent: 09-246223 (1997-09-01), None
patent: 10-125642 (1998-05-01), None
* Patent Abstracts of Japan for Publication No. 10-125642.

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