Cleaning process for photomasks

Details Cleaning process for photomasks Cleaning process for photomasks

2006-02-21

2006-02-21

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S025400, C134S031000, C134S042000

Reexamination Certificate

active

07001470

ABSTRACT:
A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O3gas solved water to eliminate organic substances adhered on a surface of the photomask (S120). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S122). After completion of these cleaning steps, the photomask is dried (S124).

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