Cleaning process for phase shift masks

Details Cleaning process for phase shift masks Cleaning process for phase shift masks

2005-01-11

2005-01-11

Webb, Gregory (Department: 1751)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C134S003000, C134S002000, C510S175000

Reexamination Certificate

active

06841311

ABSTRACT:
A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.

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patent: 508642 (2002-11-01), None

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