Cleaning probe and megasonic cleaning apparatus having the same

Details Cleaning probe and megasonic cleaning apparatus having the same Cleaning probe and megasonic cleaning apparatus having the same

2005-10-03

2008-08-19

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

C134S105000, C134S137000, C134S138000, C134S149000, C134S151000, C134S159000, C134S185000, C134S187000, C134S188000, C134S198000, C134S902000, C438S906000

Reexamination Certificate

active

07412982

ABSTRACT:
A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the center of the wafer, a rear portion connected to a piezoelectric transducer, and a protrusion located between the rear portion and the front portion, located on an edge portion of the wafer, and having a larger cross section width than the front portion.

REFERENCES:
patent: 6039059 (2000-03-01), Bran
patent: 6543080 (2003-04-01), Tomita et al.
patent: 2003/0192571 (2003-10-01), Yeo et al.
patent: 2004/0168707 (2004-09-01), Bran et al.
patent: 2006/0130871 (2006-06-01), Hwang et al.
patent: 1020030076898 (2003-09-01), None
patent: 1020030081995 (2003-10-01), None

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