Cleaning methods for silicon electrode assembly surface...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching

Reexamination Certificate

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C438S689000, C438S745000, C134S003000, C134S026000, C134S028000

Reexamination Certificate

active

11019727

ABSTRACT:
Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.

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International Search Report and Written Opinion dated Dec. 4, 2006 issued in corresponding PCT/US05/45460.

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