Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2007-07-24
2007-07-24
Smith, Zandra V. (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S689000, C438S745000, C134S003000, C134S026000, C134S028000
Reexamination Certificate
active
11019727
ABSTRACT:
Silicon electrode assembly decontamination cleaning methods and solutions, which control or eliminate possible chemical attacks of electrode assembly bonding materials, comprise ammonium fluoride, hydrogen peroxide, acetic acid, optionally ammonium acetate, and deionized water.
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Ren Daxing
Shih Hong
Buchanan & Ingersoll & Rooney PC
Lam Research Corporation
Novacek Christy
Smith Zandra V.
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