Cleaning method for substrate treatment device and substrate...

Details Cleaning method for substrate treatment device and substrate... Cleaning method for substrate treatment device and substrate...

2005-05-17

2005-05-17

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

Reexamination Certificate

active

06893964

ABSTRACT:
A cleaning gas that is obtained by vaporizing a carboxylic acid is supplied into a treatment chamber having an insulating substance adhering to the inside thereof, and the inside of the treatment chamber is evacuated. When the cleaning gas supplied into the treatment chamber comes in contact with the insulating substance adhering to an inside wall and a susceptor in the treatment chamber, the insulating substance is turned into a complex, so that the complex of the insulating substance is formed. The complex of the insulating substance is easily vaporized due to its high vapor pressure. The vaporized complex of the insulating substance is discharged out of the treatment chamber by the evacuation.

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