Cleaning method and plasma processing method

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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C134S001000, C134S022180, C134S026000, C134S030000, C438S905000

Reexamination Certificate

active

08034183

ABSTRACT:
In a RLSA microwave plasma processing apparatus that radiates microwave from a microwave generator into a chamber by using a planer antenna (Radial Line Slot Antenna) having many slots formed according to a certain pattern, the chamber contaminated with Na or the like is cleaned by using a cleaning gas containing H2and O2.

REFERENCES:
patent: 6656376 (2003-12-01), Fritsch et al.
patent: 6834656 (2004-12-01), Qingyuan et al.
patent: 2001/0042513 (2001-11-01), Kao et al.
patent: 2005/0191827 (2005-09-01), Collins et al.
patent: 2006/0281323 (2006-12-01), Ohmi et al.
patent: 2007/0077737 (2007-04-01), Kobayashi et al.
patent: 6097075 (1994-04-01), None
patent: 2000-096241 (2000-04-01), None
patent: 2004-335789 (2004-11-01), None
patent: WO 2004/100246 (2004-11-01), None
International Search Report (Form PCT/ISA/210) in connection with PCT/JP2006/300957, dated Apr. 2005.

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