Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...
Patent
1999-12-20
2000-10-17
Carrillo, Sharidan
Cleaning and liquid contact with solids
Processes
For metallic, siliceous, or calcareous basework, including...
134 221, 134 2219, 134 36, 134 40, 134902, 510175, 510372, 510375, 510432, 510434, B08B 304
Patent
active
06132521&
ABSTRACT:
A method of cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware without corroding or damaging the equipment parts and surfaces in the event of wafer breakage and non-wafer breakage is described. A solution includes an alkyldione peroxide, a stabilizing agent, and alcohols is used to oxidize the metal and form soluble complexes which are removed by the cleaning solution. Also, a alkyldione peroxide solution for cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware in the event of wafer breakage and non-wafer breakage is provided.
REFERENCES:
patent: 4714517 (1987-12-01), Malladi et al.
patent: 4814408 (1989-03-01), Itoh et al.
patent: 5650356 (1997-07-01), Grivna et al.
patent: 5882433 (1999-03-01), Ueno
Chooi Simon
Gupta Subhash
Ho Paul
Zhou Mei Sheng
Carrillo Sharidan
Chartered Semiconductor Manufacturing Ltd.
Pike Rosemary L. S.
Saile George O.
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