Cleaning liquid and cleaning method for electronic material

Details Cleaning liquid and cleaning method for electronic material Cleaning liquid and cleaning method for electronic material

2007-12-19

2011-10-25

Markoff, Alexander (Department: 1711)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S001000, C134S002000, C134S037000, C134S184000, C134S902000

Reexamination Certificate

active

08043435

ABSTRACT:
A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination.

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