Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2007-12-18
2007-12-18
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C134S003000
Reexamination Certificate
active
11038585
ABSTRACT:
A cleaning composition comprises an alkali solution, pure water, and a surfactant represented by the following chemical formula: R1-OSO3—HA+wherein R1 is one selected from a group consisting of a butyl group, an isobutyl group, an isooctyl group, a nonyl phenyl group, an octyl phenyl group, a decyl group, a tridecyl group, a lauryl group, a myristyl group, a cetyl group, a stearyl group, an oleyl group, a licenoleyl group and a behnyl group, and A is one selected from a group consisting of ammonia, ethanol amine, diethanol amine and triethanol amine.
REFERENCES:
patent: 5750031 (1998-05-01), Rahman et al.
patent: 5968539 (1999-10-01), Beerse et al.
patent: 6136514 (2000-10-01), Phan et al.
patent: 6383240 (2002-05-01), Nishimoto et al.
patent: 6451510 (2002-09-01), Messick et al.
patent: 6554912 (2003-04-01), Sahbari
patent: 6559056 (2003-05-01), Hattori et al.
patent: 6773464 (2004-08-01), Slusarewicz
patent: 4124668 (1992-04-01), None
patent: 2001-316858 (2001-11-01), None
patent: 2003 0019145 (2006-03-01), None
patent: WO 01/97268 (2001-12-01), None
patent: WO 03006598 (2003-01-01), None
Choi Sang-Jun
Han Woo-Sung
Hong Chang-Ki
Mun Chang-Sup
F. Chau & Associates LLC
Samsung Electronics Co,. Ltd.
Webb Gregory
LandOfFree
Cleaning composition and method of cleaning a semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cleaning composition and method of cleaning a semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning composition and method of cleaning a semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3835750