Cleaning chamber surfaces to recover metal-containing compounds

Details Cleaning chamber surfaces to recover metal-containing compounds Cleaning chamber surfaces to recover metal-containing compounds

2005-06-07

2005-06-07

Carrillo, Sharidan (Department: 1746)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S002000, C134S022100, C134S022110, C134S022140, C134S022190, C134S026000, C134S028000, C134S041000, C134S042000, C134S902000

Reexamination Certificate

active

06902627

ABSTRACT:
In a method of cleaning metal-containing deposits such as tantalum from a surface of a process chamber component, such as a metal surface, the surface is immersed in a cleaning solution. In one version, the cleaning solution is a solution having HF and HNO3in a ratio that removes deposits from the surface substantially without eroding the surface. In another version, the cleaning solution is a solution having KOH and H2O2. The solution can be treated after cleaning the surface to recover tantalum-containing materials and one or more of the cleaning solutions.

REFERENCES:
patent: 4756322 (1988-07-01), Lami
patent: 5391275 (1995-02-01), Mintz
patent: 5401319 (1995-03-01), Banholzer et al.
patent: 5474649 (1995-12-01), Kava et al.
patent: 5660640 (1997-08-01), Laube
patent: 5910338 (1999-06-01), Donde et al.
patent: 5916454 (1999-06-01), Richardson et al.
patent: H2087 (2003-11-01), Balliett et al.
patent: 6656535 (2003-12-01), He et al.
patent: 2002/0086118 (2002-07-01), Chang et al.
patent: 2002/0170486 (2002-11-01), Zehavi et al.
patent: 2003/0047464 (2003-03-01), Sun et al.
patent: 2003/0116276 (2003-06-01), Weldon et al.
patent: 2003/0136428 (2003-07-01), Krogh
patent: 2003/0173526 (2003-09-01), Popiolkowski et al.
patent: 2003/0221702 (2003-12-01), Peebles
patent: 2004/0045574 (2004-03-01), Tan
patent: 2004/0056211 (2004-03-01), Popiolkowski et al.
patent: 2004/0099285 (2004-05-01), Wang et al.
patent: 1 049 133 (2000-11-01), None
patent: 2 562 097 (1985-10-01), None
patent: 63-149396 (1998-06-01), None

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