Cleaning brush for semiconductor wafer

Details Cleaning brush for semiconductor wafer Cleaning brush for semiconductor wafer

1991-03-25

1992-09-08

Roberts, Edward L.

Brushing, scrubbing, and general cleaning

Machines

Wiping

15 211, 15 77, 15 882, B08B 1102

Patent

active

051447118

ABSTRACT:
Apparatus for cleaning an offset semiconductor wafer includes first and second opposed brushes circumscribing a common drive shaft. The wafer includes a circular peripheral edge. At any given instant, a first portion of the offset semiconductor wafer is positioned between and contacts the brushes while the second remaining portion of the semiconductor wafer extends outwardly from between the brushes. The peripheral edge of the second portion of the wafer contacts and is turned by a rotating support member.

REFERENCES:
patent: 2530530 (1950-11-01), Littlefield
patent: 3150401 (1964-09-01), Taylor et al.
patent: 4486911 (1984-12-01), Beke
patent: 4566911 (1986-01-01), Tomita et al.
patent: 4811443 (1989-03-01), Nishizawa
patent: 4935981 (1990-06-01), Ohtani et al.

Affiliated with

Also associated with

Rating

Cleaning brush for semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning brush for semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning brush for semiconductor wafer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-126945