Cleaning apparatus

Details Cleaning apparatus Cleaning apparatus

1994-08-18

1996-01-09

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With non-impelling fluid deflector or baffle other than...

134902, B08B 304

Patent

active

054820685

ABSTRACT:
A chemical cleaning section of a semiconductor wafer cleaning system has a processing vessel. Two cleaning liquid supplying ports are formed in a bottom portion of the vessel. A holder for holding a plurality of wafers at intervals is arranged in the vessel. A rectifying plate is arranged between the holder and the supplying ports and a diffusion plate is arranged between the rectifying plate and the supplying ports. Bubble storage members are formed on a lower surface of the rectifying plate, so as to be located just above both side edges of the diffusion plate extending in a direction in which the wafers are aligned. The bubble storages are connected to the outside of the vessel through exhaust holes and exhaust pipes. Bubbles contained in a cleaning liquid supplied through the supplying ports are discharged from the bubble storages through the exhaust pipes to the outside of the vessel. As a result, the wafers are not influenced by the bubbles.

REFERENCES:
patent: 5000795 (1991-03-01), Chung et al.
patent: 5327921 (1994-07-01), Mokuo et al.

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