Cleaning agent and method for cleaning semiconductor wafers

Details Cleaning agent and method for cleaning semiconductor wafers Cleaning agent and method for cleaning semiconductor wafers

1995-08-10

1997-12-09

Warden, Robert J.

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 2, 134 26, 134 28, 134 29, B08B 300

Patent

active

056955723

ABSTRACT:
A cleaning agent and method are useful for cleaning semiconductor wafers. The aqueous cleaning agent has a pH of 1 to 5, preferably a pH of 1 to 3, and contains at least one surfactant and at least one compound which belongs to a group of compounds comprising succinic acid and its derivatives. To clean the semiconductor wafers, a thin film of cleaning agent is generated on the side faces of the semiconductor wafers, preferably using a mechanical tool.

REFERENCES:
patent: 3915633 (1975-10-01), Ramachandran
patent: 4009299 (1977-02-01), Flowers et al.
patent: 4014715 (1977-03-01), Preston
patent: 4376057 (1983-03-01), Angelo et al.
patent: 4714517 (1987-12-01), Malladi et al.
patent: 4795582 (1989-01-01), Ohmi et al.
patent: 5061393 (1991-10-01), Linares et al.
patent: 5397397 (1995-03-01), Awad
Antilla et al. Metal Contamination Removal on Silicon Wafers using Dilute Acidic Solutions, J. Electrochem. Soc. V. 139, No. 6, Jun. 1992, pp. 1751-1756.
Database WPI, Section Ch, Week 8451 Derwent Publications Ltd., London, GB; AN 84-314862 & JP-A-59196385 (Shinko Denki KK), Nov. 7, 1984.
Derwent Abstract for German DE 4209865, Sep. 1993.
Werner Kern, David A. Puotinen, RCA Review, vol. 31, pp. 187-206, (1970).
P.H. Singer, Semiconductor International, pp. 36-39 (Dec. 1992).
W.C. Krusell and D.I. Golland, Proc. Electrochem. Soc., pp. 23-32 (1990).

Affiliated with

Also associated with

Rating

Cleaning agent and method for cleaning semiconductor wafers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning agent and method for cleaning semiconductor wafers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning agent and method for cleaning semiconductor wafers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1604300