Class of E-beam resists based on conducting organic charge trans

Details Class of E-beam resists based on conducting organic charge trans Class of E-beam resists based on conducting organic charge trans

1981-07-28

1982-07-06

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430292, 430339, 430296, 430942, 430495, G03C 172

Patent

active

043383920

ABSTRACT:
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.

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patent: 3779806 (1973-12-01), Gipstein et al.
patent: 4036648 (1977-07-01), Engler et al.

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