Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-12-13
2005-12-13
Werner, Brian (Department: 2621)
Image analysis
Applications
Manufacturing or product inspection
Reexamination Certificate
active
06975754
ABSTRACT:
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
REFERENCES:
patent: 4870357 (1989-09-01), Young et al.
patent: 5043663 (1991-08-01), Lam
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 6087673 (2000-07-01), Shishido et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6504948 (2003-01-01), Schemmel et al.
patent: 2001/0000460 (2001-04-01), Ishihara et al.
patent: 57-196377 (1982-02-01), None
Hiroi Takashi
Kuni Asahiro
Miyai Hiroshi
Nara Yasuhiko
Nozoe Mari
Hitachi , Ltd.
Townsend and Townsend / and Crew LLP
Werner Brian
LandOfFree
Circuit pattern inspection method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Circuit pattern inspection method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Circuit pattern inspection method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3495297