Circuit pattern inspection method and apparatus

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Reexamination Certificate

active

06975754

ABSTRACT:
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.

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patent: 5043663 (1991-08-01), Lam
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 6087673 (2000-07-01), Shishido et al.
patent: 6411377 (2002-06-01), Noguchi et al.
patent: 6504948 (2003-01-01), Schemmel et al.
patent: 2001/0000460 (2001-04-01), Ishihara et al.
patent: 57-196377 (1982-02-01), None

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