Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-05-24
2005-05-24
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Applications
Manufacturing or product inspection
C382S147000, C382S172000, C356S394000
Reexamination Certificate
active
06898305
ABSTRACT:
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
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Abstract, JP App. 57-196377(A), “Pattern Recognizing Mehtod”, Feb. 12, 1982.
Hiroi Takashi
Kuni Asahiro
Miyai Hiroshi
Nara Yasuhiko
Nozoe Mari
Chawan Sheela
Hitachi , Ltd.
Mehta Bhavesh M.
Townsend and Townsend / and Crew LLP
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