Circuit pattern inspection method and apparatus

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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Details

C382S147000, C382S172000, C356S394000

Reexamination Certificate

active

06898305

ABSTRACT:
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.

REFERENCES:
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patent: 5146509 (1992-09-01), Hara et al.
patent: 5153444 (1992-10-01), Maeda et al.
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5640200 (1997-06-01), Michael
patent: 6087673 (2000-07-01), Shishido et al.
patent: 6363167 (2002-03-01), Miyano et al.
patent: 6678404 (2004-01-01), Lee et al.
Abstract, JP App. 57-196377(A), “Pattern Recognizing Mehtod”, Feb. 12, 1982.

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