Circuit for adjusting the impedance of a plasma section to a hig

Details Circuit for adjusting the impedance of a plasma section to a hig Circuit for adjusting the impedance of a plasma section to a hig

1989-09-25

1992-08-18

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31323131, 331 74, 333 32, H01J 724, H05H 146

Patent

active

051402238

ABSTRACT:
A circuit for adjusting the impedance of a plasma section to a high-frequency generator wherein three capacitors are connected in series between the high-frequency generator and an electrode of the plasma section; located between the generator and the electrode are two parallel oscillatory circuits.

REFERENCES:
patent: 3569777 (1971-03-01), Beaudry
patent: 4207137 (1980-06-01), Tretola
patent: 4373581 (1983-02-01), Toellner
patent: 4810933 (1989-03-01), Moisan et al.
patent: 4827219 (1989-05-01), Harrison
patent: 4877999 (1989-10-01), Knapp et al.
Enhancement of the plasma density and deposition rate in rf discharges--Overzet et al.
Power loss mechanisms in radio frequency dry etching systems--W. G. M. van den Hoek et al.
Deposition of Tantalum and Tantalum Oxide by Superimposed RF and D-C Sputtering--F. Vratny.

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