Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-01-18
2005-01-18
Niebling, John F. (Department: 2812)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S316000, C257S317000
Reexamination Certificate
active
06844585
ABSTRACT:
A MOS transistor and subsurface collectors can be formed by using a hard mask and precisely varying the implant angle, rotation, dose, and energy. In this case, a particular atomic species can be placed volumetrically in a required location under the hard mask. The dopant can be implanted to form sub-silicon volumes of arbitrary shapes, such as pipes, volumes, hemispheres, and interconnects.
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Hopper Peter J.
Lindorfer Philipp
Strachan Andy
Vashchenko Vladislav
Lindsay Jr. Walter L.
National Semiconductor Corporation
Niebling John F.
Pickering Mark C.
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