Chuck for holding semiconductor photolithography masks

Details Chuck for holding semiconductor photolithography masks Chuck for holding semiconductor photolithography masks

1996-05-20

1998-05-12

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

216 41, H01L 2100, B44C 122

Patent

active

057500037

ABSTRACT:
A mask chuck for fabricating a semiconductor mask which reduces spinning turbulence comprising: a top plate attached to a base by supports. The top plate has a cylindrical shape, a top surface, and rounded outer edges. The top plate preferably has a square opening extending through the top plate. Preferably four ledges extend out from along the corners of the opening. The four edges of the opening having four notches having ledges. Pins are mounted on the ledges. The pins extend upward towards the top surface of the top plate. A mask rests on the pins and the pins are adjusted so that the top surface of the mask is even with the top surface of said top plate. The mask chuck reduced turbulence having a cylindrical aerodynamic shape, an opening which is closely fitted to the mask and pins which level the top surface of the mask with the top surface of the chuck.

REFERENCES:
patent: 5202748 (1993-04-01), MacDonald et al.
patent: 5376216 (1994-12-01), Yoshioka et al.

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