Chlorotrifuorine gas generator system

Details Chlorotrifuorine gas generator system Chlorotrifuorine gas generator system

2005-08-16

2005-08-16

Johnson, Jerry D (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

C422S198000, C422S307000, C422S305000, C422S306000, C422S906000, C423S464000, C423S466000, C156S354000, C156S354000, C427S248100, C427S255390, C427S255700, C427S533000, C427S534000, C427S535000, C427S307000

Reexamination Certificate

active

06929784

ABSTRACT:
A ClF3gas generation system is provided with supply sources of chlorine (3) (for example a cylinder of compressed chlorine) and fluorine (4) (for example a fluorine generator) connected into a gas reaction chamber (2) enabling generation of ClF3gas. The reaction chamber has a valved outlet (C) for the supply of the ClF3gas to a process chamber for immediate local use.

REFERENCES:
patent: 3876754 (1975-04-01), Pursley
patent: 5688384 (1997-11-01), Hodgson et al.
patent: 6841141 (2005-01-01), Arno et al.
Saitiq et al; Plasmaless Cleaning Process of Silicone Surface Using Chlorine Trifluoride; Mar. 19, 1990; Applied Physics Letters 56 (12); pp. 1190-1121.
Ibbotson et al; Plasmaless Dry Etching of Silicon with Fluorine Containing Compounds; Nov. 15, 1984; Applied Physics Letters 56(10); pp. 2939-2942.

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