Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-08-07
2007-08-07
Lee, Calvin (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257S772000
Reexamination Certificate
active
11116157
ABSTRACT:
A chip scale package has a semiconductor MOSFET die which has a top electrode surface covered with a layer of a photosensitive liquid epoxy which is photolithographically patterned to expose portions of the electrode surface and to act as a passivation layer and as a solder mask. A solderable contact layer is then formed over the passivation layer. The individual die are mounted drain side down in a metal clip or can with the drain electrode disposed coplanar with a flange extending from the can bottom.
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English translation of a Japanese Office Action dated Feb. 4, 2005 from Japanese Patent Application No. 2001-573,539.
Schofield Hazel Deborah
Standing Martin
International Rectifier Corporation
Lee Calvin
Ostrolenk Faber Gerb & Soffen, LLP
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