Chemically treated photoresist for withstanding ion bombarded pr

Details Chemically treated photoresist for withstanding ion bombarded pr Chemically treated photoresist for withstanding ion bombarded pr

1998-12-14

2000-04-04

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430954, 430327, G03C 176

Patent

active

060459786

ABSTRACT:
A photosensitive photoresist material which is effective for use as an ion etch barrier layer after patterning. The photoresist composition includes the reaction product of a compound having the general formula R.sub.1 --COO--(CH.sub.2).sub.n --O--R.sub.2 and a silylating agent.

REFERENCES:
patent: 4497891 (1985-02-01), Kaplan et al.
patent: 4689289 (1987-08-01), Crivello
patent: 5091290 (1992-02-01), Rolfson
patent: 5370908 (1994-12-01), O'Connor et al.
patent: 5688634 (1997-11-01), Mixon et al.
patent: 5741629 (1998-04-01), Chandross et al.

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